Benschop, Jos: search on Z-Library

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1

[IEEE 2019 Electron Devices Technology and Manufacturing Conference (EDTM) - Singapore, Singapore (2019.3.12-2019.3.15)] 2019 Electron Devices Technology and Manufacturing Conference (EDTM) - Enabling manufacturing of sub-10nm generations of integrated circuits with EUV lithography

Yen, Anthony, Meiling, Hans, Benschop, Jos

Year:

2019

Language:

english

File:

PDF, 350 KB

english, 2019

2

Holistic optimization architecture enabling sub-14-nm projection lithography

Mulkens, Jan, Hinnen, Paul, Kubis, Michael, Padiy, Alexander, Benschop, Jos

Journal:

Journal of Micro/Nanolithography MEMS and MOEMS

Year:

2014

Language:

english

File:

PDF, 4.53 MB

english, 2014

3

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 26 February 2017)] Extreme Ultraviolet (EUV) Lithography VIII - The future of EUV lithography: enabling Moore's Law in the next decade

Panning, Eric M., Goldberg, Kenneth A., Pirati, Alberto, van Schoot, Jan, Troost, Kars, van Ballegoij, Rob, Krabbendam, Peter, Stoeldraijer, Judon, Loopstra, Erik, Benschop, Jos, Finders, Jo, Meiling,

Year:

2017

Language:

english

File:

PDF, 10.99 MB

english, 2017

4

SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Emerging Lithographic Technologies IV - Relationship between an EUV source and the performance of an EUV lithographic system

Banine, Vadim, Benschop, Jos P., Leenders, Martyn, Moors, Roel, Dobisz, Elizabeth A.

Year:

2000

Language:

english

File:

PDF, 1.29 MB

english, 2000

5

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 24 February 2013)] Optical Microlithography XXVI - Integrated scatterometry for tight overlay and CD control to enable 20-nm node wafer manufacturing.

Benschop, Jos, Conley, Will, Engelen, Andre, Cramer, Hugo, Kubis, Michael, Hinnen, Paul, van der Laan, Hans, Bhattacharyya, Kaustuve, Mulkens, Jan

Year:

2013

Language:

english

File:

PDF, 1.38 MB

english, 2013

6

The role of pinhole structures in Mo thin films on multi-layer graphene synthesis

Kizir, Seda, van den Beld, Wesley, Schurink, Bart, van de Kruijs, Robbert, Benschop, Jos, Bijkerk, Fred

Journal:

Journal of Physics: Materials

Year:

2020

Language:

english

File:

PDF, 840 KB

english, 2020

7

SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Emerging Lithographic Technologies V - Progress of the EUVL alpha tool

Meiling, Hans, Benschop, Jos P., Dinger, Udo, Kuerz, Peter, Dobisz, Elizabeth A.

Year:

2001

Language:

english

File:

PDF, 929 KB

english, 2001

8

SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Emerging Lithographic Technologies IV - EUCLIDES: first phase completed!

Benschop, Jos P., Dinger, Udo, Ockwell, David C., Dobisz, Elizabeth A.

Year:

2000

Language:

english

File:

PDF, 3.67 MB

english, 2000

9

An Update on the Progress in High-n Immersion Lithography

Sewell, Harry, Graeupner, Paul, McCafferty, Diane, Markoya, Louis, Samarakone, Nandasiri, Wijnen, Paul van, Mulkens, Jan, Benschop, Jos

Journal:

Journal of Photopolymer Science and Technology

Year:

2008

Language:

english

File:

PDF, 438 KB

english, 2008

10

SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Emerging Lithographic Technologies VI - EXTATIC: ASML's α-tool development for EUVL

Meiling, Hans, Benschop, Jos P., Hartman, Robert A., Kuerz, Peter, Hoghoj, Peter, Geyl, Roland, Harned, Noreen, Engelstad, Roxann L.

Year:

2002

Language:

english

File:

PDF, 1.02 MB

english, 2002

11

Confocal compact scanning optical microscope based on compact disc technology

Benschop, Jos, van Rosmalen, Gerard

Journal:

Year:

1991

Language:

english

File:

PDF, 1.88 MB

english, 1991

12

Experimental Stress and Immunological Reactivity

Brosschot, Jos F., Godaert, Guido L. R., Benschop, Robert J., Olff, Miranda, Ballieux, Rudy E., Heijnen, Cobi J.

Journal:

Psychosomatic Medicine

Year:

1998

Language:

english

File:

PDF, 515 KB

english, 1998

13

Extreme ultraviolet lithography: Status and prospects

Benschop, Jos, Banine, Vadim, Lok, Sjoerd, Loopstra, Erik

Journal:

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures

Year:

2008

Language:

english

File:

PDF, 862 KB

english, 2008

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